New Technology: ZEI launches a new high performance wafer and mask tuning system

JENA/Germany, 05.09.2016.

ZEISS introduces the new ZEISS ForTune system for photomask tuning. With its latest optical design, it takes two main mask tuning processes to the next level in terms of efficiency, accuracy and throughput. The first tool has already been delivered to the first customer.

The new ZEISS ForTune mask tuning system combines the capabilities from ZEISS CDC and RegC in a new advanced system. This means mask registration and Critical Dimension Uniformity (CDU) can be completed in one process. It helps to:

Expand the Lithography Process Window and reduce the wafer intrafield hot spots (using the CDC technology)

Improve wafer intra-field On-Product Overlay and enhance Mask Image Placement (using the RegC technology)

ZEISS ForTune is a state-of-the-art technology with advanced system and optics design, allowing for high process efficiency and prediction accuracy, as well as for significantly improved output.

The mask tuning system has been first introduced to Wafer Fab customers at the SEMICON West in San Francisco, USA in July 2016 and was much appreciated. In order to produce IC devices at sub-16nm design nodes, semiconductor manufacturers are integrating many novel technologies, including multiple patterning, spacer pitch splitting, 3D logic and memory structures, new materials and complex reticles. Using these new technologies requires tight specifications for On-Product Overlay, Mask Registration, and Lithography Process Window. ForTune is a powerful new technology that enables Mask Makers and Wafer Fabs to tackle these challenges in a fast and cost-effective way , states Ofir Sharoni, Product Manager of ZEISS ForTune in Karmiel, Israel. Another presentation of the new system will take place at the SPIE Photomask Conference in September 2016 in San Jose, USA.

Besides the official product launch, the next generation Wafer and Mask Tuning System has already been successfully delivered to an US based chip manufacturer, who ordered the new ZEISS ForTune system earlier this year.

www.zeiss.com/mask-tuning

$DAM-3861DE9D99A5D8C3C125801F0023BDEE

Press contact

Christina Flesch

Semiconductor Manufacturing Technology

Phone: +49 3641 64-2242

Fax:

christina.flesch@zeiss.com

About ZEISS

ZEISS is an internationally leading technology enterprise operating in the optics and optoelectronics industries. The ZEISS Group develops and distributes semiconductor manufacturing equipment, measuring technology, microscopes, medical technology, eyeglass lenses, camera and cine lenses, binoculars and planetarium technology. With its solutions, the company constantly advances the world of optics and helps shape technological progress. ZEISS is divided up into the four segments Semiconductor Manufacturing Technology, Research & Quality Technology, Medical Technology, and Vision Care/ Consumer Optics. ZEISS is represented in over 40 countries and operates more than 30 production sites, over 50 sales and service locations and about 25 research and development facilities. In fiscal year 2014/15 the company generated revenue approximating 4.5 billion with around 25,000 employees. Founded in 1846 in Jena, the company is headquartered in Oberkochen, Germany. Carl Zeiss AG is the strategic management holding company that manages the ZEISS Group. The company is wholly owned by the Carl Zeiss Stiftung (Carl Zeiss Foundation).

Further information at www.zeiss.de

Semiconductor Manufacturing Technology

With a broad portfolio of products and globally leading know-how in the areas of lithography and optical modules, the business group covers various key processes in microchip production. Semiconductor Manufacturing Technology includes the Semiconductor Manufacturing Optics and Semiconductor Metrology Systems strategic business units. It is headquartered in Oberkochen. During fiscal year 2014/15, this segment generated revenue of 893 million and employed around 2,800 people.

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