Cooperation: ZEI and TNO Establish Partnership to Enable Development of Next-Generation Liography Optics

HANNOVER/Germany, OBERKOCHEN/Germany, 30.04.2014.

ZEISS and TNO announced today that they have established a strategic partnership aimed to enable next-generation optics for semiconductor manufacturing.

The ZEISS Semiconductor Manufacturing Technology business group and TNO are defining the feasibility and requirements of a new experimental environment to study the impact of radiation induced plasma on material surfaces and vacuum conditions. The new facility will support the common goal of understanding of molecular contamination effects of reflective surfaces under extreme ultraviolet radiation conditions. This will speed up the development of new optical components required for the next-generation of systems needed for the production of even faster and smaller computer chips.

Since the ever-evolving race for smaller chip interconnect features requires a full understanding and suitable application of the physics and chemistry of material-photon interaction, ZEISS and TNO have partnered to develop a state-of-the-art experimental facility to characterise and analyse the behavior of components and materials for semiconductor processing applications under EUV illumination. This initiative is based on a long-standing relationship between TNO and ZEISS. For more than a decade we are running challenging technical and scientific projects together successfully , said Dr. Thomas Stammler, Senior Director Design & Technology in the ZEISS Semiconductor Manufacturing Technology business group. This joint project builds on the proven technical expertise in EUV optics manufacturing of ZEISS and TNO's experience and innovative ability in nanoscale contamination control to enable solutions that can meet future challenges.

Collaboration between TNO and the ZEISS Semiconductor Manufacturing Technology business group combines our respective strengths and expertise in the development of next-generation semiconductor equipment , said Arnold Stokking, Managing Director Industrial Innovation of TNO. We are pleased to have the industry leader in semiconductor manufacturing technology as a partner, to strengthen our programs, comprised in TNO's International Center for Contamination Control (ICCC), to accelerate the equipment development and performance for the semiconductor industry.

About TNO

TNO is an independent innovation organisation. TNO connects people and knowledge to create innovations that sustainably boost the competitive strength of industry and the welfare of society. TNO's International Center for Contamination Control has been established to focus dedicated contamination control research and development for partners in industry, supported by an extensive variety of experimental facilities.

TNO's more than 4,000 professionals work on practicable knowledge and solutions for the problems of global scarcity. TNO focuses its efforts on seven themes including Industrial Innovation. TNO reinforces the innovative strength of industry through innovation in products and processes, with a strong focus on sustainability.

Ilka Hauswald

Carl Zeiss SMT GmbH

Phone: +49 7364 20-9231

Fax: +49 7364 20-9205

ilka.hauswald@zeiss.com Number: 0055-2014-ENG SE

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