New Mask System for EUV Use: ZEISS Launches ForTune EUV: a Novel, High Performance Mask Tuning System for EUV Technology

JENA/Germany, 11.09.2017. The new ZEISS ForTune EUV is a novel, state-of-the-art Mask Tuning system for EUV technology using ultrashort pulse laser technology. EUV technology presents new challenges with respect to mask registration and especially intra-field Mixed & Matched Overlay between DUV and EUV layers. The system has been specifically designed to support EUV lithography by improving the mask registration performance of EUV masks and wafer intra-field overlay.

With its advanced technology, ZEISS ForTune EUV enables accurate and reliable tuning process control with significantly enhanced performance:

by achieving registration improvement (mask level) > 70%

1. by reducing intra-field EUV DUV Mixed & Matched Overlay (MMO) to the sub nanometer range (wafer level)

The ZEISS ForTune EUV system processed the first customer EUV masks, exceeding the expected results of registration error below 1 nm.

The mask tuning system will be presented for the first time to all mask shops and wafer fab customers at the SPIE Photomask Technology & Extreme Ultraviolet Lithography Conference in Monterey, California/USA in September 2017.

ZEISS ForTune EUV uses advanced optical technology designed for EUV challenges, in combination with accurate process algorithm and high computational power. It is a powerful new technology that enables EUV mask makers and wafer fabs to tackle the registration and overlay challenges in a fast and cost-effective way, states Alla Bitensky, Product Manager for Photomask Tuning products.

For more information: www.zeiss.com/mask-tuning

$DAM-BCA0A45FA654A8C6C12581980047E08B

Christina Flesch

Semiconductor Manufacturing Technology

Phone: +49 3641 64-2593

Fax:

christina.flesch@zeiss.com

About ZEISS

ZEISS is an internationally leading technology enterprise operating in the fields of optics and optoelectronics. The ZEISS Group develops, produces and distributes measuring technology, microscopes, medical technology, eyeglass lenses, camera and cinema lenses, binoculars and semiconductor manufacturing equipment. With its solutions, the company constantly advances the world of optics and helps shape technological progress. ZEISS is divided up into the four segments Research & Quality Technology, Medical Technology, Vision Care/Consumer Products and Semiconductor Manufacturing Technology. The ZEISS Group is represented in more than 40 countries and has over 50 sales and service locations, more than 30 manufacturing sites and about 25 research and development centers around the globe. In fiscal year 2015/16 the company generated revenue approximating 4.9 billion with over 25,000 employees. Founded in 1846 in Jena, the company is headquartered in Oberkochen, Germany. Carl Zeiss AG is the strategic management holding company that manages the ZEISS Group. The company is wholly owned by the Carl Zeiss Stiftung (Carl Zeiss Foundation).

Further information at www.zeiss.de

Semiconductor Manufacturing Technology

With its broad product portfolio and expertise, the Semiconductor Manufacturing Technology segment of ZEISS covers a variety of key processes in the production of microchips. Its products include semiconductor manufacturing optics notably lithography optics as well as photomask systems and process control solutions for semiconductor manufacturing. Thanks to ZEISS technology, microchips are becoming increasingly more powerful, more energy-efficient and more affordable. The electronic applications of these ongoing enhancements enable global progress in many disciplines such as technology, electronics, communication, entertainment, mobility and energy. Semiconductor Manufacturing Technology is headquartered in Oberkochen. Other sites include Jena, Rossdorf and Wetzlar in Germany, as well as Bar Lev (Israel) and Pleasanton, CA (USA). During fiscal year 2015/16, the segment generated revenue of 972 million and employed around 2,700 people.

Number: 0087-2017-ENG SE

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