Succeful Cooperation: ZEI Shipped First PROVE HR System to NuFlare Technology, Inc.

JENA/Germany, YOKOHAMA/Japan, 08.04.2014.

NuFlare Technology, the market leader in electron-beam mask writers, approved in a factory acceptance all specifications of the next generation mask metrology tool PROVE HR. ZEISS PROVE enables the calibration of most advanced mask writing tools needed to support upcoming optical as well as next generations lithography technologies like EUV. The system was shipped to Japan at the end of March.

The new PROVE HR convinces with a superior resolution realized by a redesigned beam path working with an NA of 0.8 at 193nm wavelength. Fumiaki Shigemitsu, President of NuFlare Technology, Inc., confirms the excellent tool performance. The achieved measurement results are beyond our expectations and allow us to adjust even the smallest deflection fields in our e-beam tools for any remaining placement error. The much higher sampling of small features enables a better tool calibration of our e-beam writers. Nuflare will use the ZEISS metrology tool to develop special calibration routines for newest mask writer generations.

Dr. Oliver Kienzle, Managing Director of Carl Zeiss SMS GmbH highlights the benefits of the successful cooperation. The coherent development of mask writing and mask registration tools is a real enabler for the industry. The advances on both sides promote next generation lithography technologies such as Multi-Patterning, Directed Self-Assembly and EUV as well as EUV and 193i mix-and-match using cut masks. Therefore we are looking forward to extend our cooperation with NuFlare Technology in the future.

Further information regarding the PROVE family tools PROVE Compact and PROVE HR can be found on the website Mask Metrology.

PROVE HR System

Nadine Sch tze

Marketing & Communication

Semiconductor Manufacturing Technology

Phone: +49 3641 64-4051

Fax:

nadine.schuetze@zeiss.com Number: 0040-2014-ENG SE

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